Particle Formation Mechanism of TiCl4 Hydrolysis to Prepare Nano TiO2

成核 粒径 化学工程 Crystal(编程语言) 粒子(生态学) 粒度分布 化学 材料科学 纳米技术 物理化学 有机化学 海洋学 计算机科学 工程类 程序设计语言 地质学
作者
Qianjun Le,YU Sheng-fei,Wusheng Luo
出处
期刊:Applied sciences [MDPI AG]
卷期号:13 (22): 12213-12213
标识
DOI:10.3390/app132212213
摘要

This study utilizes Aspen Plus chemical process simulation software (V11), applies uniform nucleation theory and growth kinetics equations, and explores the particle formation mechanism of TiCl4 hydrolysis to prepare nano TiO2. In the water/ethanol system, the effects of the reaction time, reaction temperature, water addition, pH value, and ethanol amount on the crystal nucleation rate and TiO2 particle distribution (PSD) were studied in detail by adding triethanolamine dropwise and using the Aspen Plus chemical process software simulation calculation method. The calculation results indicate that at room temperature, the formation of TiO2 crystal nuclei mainly occurs in the first 300 s and then enters the growth stage. The reaction was carried out under neutral conditions at room temperature for 4 h in 1 mL TiCl4, 6 mL C6H15NO3, 15 mL H2O, and 30 mL C2H5OH. The maximum number of particles reached 195 mesh per cubic micrometer, and the particle size after crystal nucleus growth was smaller, with a D50 of 6.15 nm. The distribution curve shows a normal distribution, which is basically consistent with the experimental results. When studying various factors, it was found that controlling the reaction time within 60 min and maintaining the reaction temperature at room temperature can reduce the particle size D50 to 2.44 nm. Continuing to adjust the amount of water added, it was found that at 1 mL, D50 decreased again to 0.19 nm. Adjusting the pH value found that maintaining the neutrality did not change the particle size. Continuing to adjust ethanol, it was found that adding an appropriate amount of ethanol promoted nucleation and growth. At 4 mL, the maximum number of particles reached 199 mesh per cubic micrometer, but D50 slightly increased to 0.24 nm.
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