石墨烯
材料科学
电导
化学气相沉积
电阻率和电导率
电导率
纳米技术
纳米晶材料
基质(水族馆)
石墨烯纳米带
氧化石墨烯纸
化学工程
化学物理
凝聚态物理
化学
物理化学
物理
海洋学
工程类
地质学
电气工程
作者
Yohan Kim,Chang‐Seok Lee,Seungwoo Son,Keun Wook Shin,Kyung‐Eun Byun,Hyeon‐Jin Shin,Zonghoon Lee,Hyung‐Joon Shin
出处
期刊:Small
[Wiley]
日期:2023-10-06
卷期号:20 (7)
标识
DOI:10.1002/smll.202308176
摘要
Abstract The structure of graphene grown in chemical vapor deposition (CVD) is sensitive to the growth condition, particularly the substrate. The conventional growth of high‐quality graphene via the Cu‐catalyzed cracking of hydrocarbon species has been extensively studied; however, the direct growth on noncatalytic substrates, for practical applications of graphene such as current Si technologies, remains unexplored. In this study, nanocrystalline graphene (nc‐G) spirals are produced on noncatalytic substrates by inductively coupled plasma CVD. The enhanced out‐of‐plane electrical conductivity is achieved by a spiral‐driven continuous current pathway from bottom to top layer. Furthermore, some neighboring nc‐G spirals exhibit a homogeneous electrical conductance, which is not common for stacked graphene structure. Klein‐edge structure developed at the edge of nc‐Gs, which can easily form covalent bonding, is thought to be responsible for the uniform conductance of nc‐G aggregates. These results have important implications for practical applications of graphene with vertical conductivity realized through spiral structure.
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