中间层
系统集成
通过硅通孔
计算机科学
材料科学
硅
纳米技术
操作系统
光电子学
蚀刻(微加工)
图层(电子)
出处
期刊:IEEE Transactions on Components, Packaging and Manufacturing Technology
[Institute of Electrical and Electronics Engineers]
日期:2022-08-01
卷期号:12 (8): 1271-1281
被引量:17
标识
DOI:10.1109/tcpmt.2022.3194374
摘要
In this study, the recent advances and trends in multiple system and heterogeneous integration with through-silicon via (TSV)-less interposer (organic interposer or 2.3-D IC integration) will be investigated. Emphasis is placed on the definition, kinds, advantages and disadvantages, challenges (opportunities), and examples of multiple system and heterogeneous integration with TSV-less interposer. Also, some recommendations of 2.3-D IC integration will be provided.
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