氮化硅
材料科学
化学气相沉积
硅
刮擦
图层(电子)
折射率
纳米技术
原子层沉积
光电子学
沉积(地质)
发光
氮化硅
复合材料
古生物学
生物
沉积物
作者
Yue Shi,Liang He,Fangcao Guang,Luhai Li,Zhiqing Xin,Ruping Liu
出处
期刊:Micromachines
[MDPI AG]
日期:2019-08-20
卷期号:10 (8): 552-552
被引量:57
摘要
Silicon oxynitride (SiNxOy) is a highly promising functional material for its luminescence performance and tunable refractive index, which has wide applications in optical devices, non-volatile memory, barrier layer, and scratch-resistant coatings. This review presents recent developments, and discusses the preparation methods, performance, and applications of SiNxOy film. In particular, the preparation of SiNxOy film by chemical vapor deposition, physical vapor deposition, and oxynitridation is elaborated in details.
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