Silicon Production from SiO Gas via Gas-Phase Reactions

气相 瓶颈 原材料 生产(经济) 工作(物理) 材料科学 工艺工程 猝灭(荧光) 过程(计算) 化学工程 化学 计算机科学 机械工程 工程类 物理化学 光电子学 物理 有机化学 光学 荧光 经济 嵌入式系统 宏观经济学 操作系统
作者
Halvor Dalaker
出处
期刊:The minerals, metals & materials series 卷期号:: 33-40 被引量:1
标识
DOI:10.1007/978-3-030-92559-8_4
摘要

The production of siliconSilicon with hydrogenHydrogen is very challenging, although it is possible to get partway there, as SiO gas can form from SiO2 and H2. For some applications, metallurgical grade siliconSilicon is only an intermediary to gas-phase siliconSilicon species and “not needed” from a value-chain point of view. This work explores the possibility of going directly from SiO gas to useful Si-based gases with gas-phase chemistry. In particular, it looks into reactions between SiO gas and Cl2 gas to form SiCl4, which can be turned into raw materials for polysilicon production in the Siemens process. If successfully implemented, this would make CO2-free polysilicon production possible. The work is theoretical in nature and is based on thermodynamical calculations using FactSage. Assessing the process steps in isolation, calculations show that both SiO formation from H2 and SiO2 and the formation of SiCl4 from SiO are thermodynamically favourable. Combining the two steps in a process is likely to be challenging however, since if H2/H2O from the first step is present during the second, this will interfere with the chlorination of SiO, representing a serious bottleneck. Unless SiO can somehow be separated from H2/H2O at very high temperatures, success seems to be dependent on rapid quenching while suppressing back-reactions.

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