等离子体增强化学气相沉积
材料科学
热膨胀
硅
复合材料
极限抗拉强度
薄膜
沉积(地质)
化学气相沉积
偏转(物理)
纳米技术
光学
冶金
古生物学
物理
生物
沉积物
作者
V. R. Shayapov,Yu. M. Rumyantsev,A.A. Dzyuba,B. M. Ayupov,Н. И. Файнер
标识
DOI:10.1016/j.apsusc.2012.11.017
摘要
Silicon carbonitride films were obtained by PECVD method from hexamethyldisilazane at different deposition temperatures. Mechanical stresses in the films were studied by laser beam deflection method. It was found that the films deposited at low temperatures (below 400 °C) are in compressive internal stresses because of the volume expansion of the growing film. Meanwhile, the films deposited at high temperatures (above 400 °C) have tensile stresses due to volume contraction during deposition. In addition, the dependences of coefficient of thermal expansion and Young's modulus of the films on deposition temperature are obtained. The results are discussed in the light of known features of the deposition process and also chemical and phase composition of the films.
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