材料科学
等轴晶
焊接
烧结
扫描电子显微镜
钎焊
X射线光电子能谱
微量分析
金属化
聚焦离子束
基质(水族馆)
复合材料
接头(建筑物)
微观结构
冶金
图层(电子)
化学工程
离子
物理
海洋学
有机化学
合金
量子力学
工程类
地质学
建筑工程
化学
作者
Govindarajan Muralidharan,Donovan N. Leonard,Harry M. Meyer
标识
DOI:10.1007/s11664-016-5216-8
摘要
There is a need for next-generation, high-performance power electronic packages and systems employing wide-bandgap devices to operate at high temperatures in automotive and electric grid applications. Sintered silver joints are currently being evaluated as an alternative to Pb-free solder joints. Of particular interest is the development of joints based on silver paste consisting of nano- or micron-scale particles that can be processed without application of external pressure. The microstructural evolution at the interface of a pressureless-sintered silver joint formed between a SiC die with Ti/Ni/Au metallization and an active metal brazed (AMB) substrate with Ag metallization at 250°C has been evaluated using scanning electron microscopy (SEM), x-ray microanalysis, and x-ray photoelectron spectroscopy (XPS). Results from focused ion beam (FIB) cross-sections show that, during sintering, pores in the sintered region near to the Au layer tend to be narrow and elongated with long axis oriented parallel to the interface. Further densification results in formation of many small, relatively equiaxed pores aligned parallel to the interface, creating a path for easy crack propagation. X-ray microanalysis results confirm interdiffusion between Au and Ag and that a region with poor mechanical strength is formed at the edge of this region of interdiffusion.
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