材料科学
腐蚀
惰性
薄膜
化学气相沉积
合并(版本控制)
冶金
氮化硼
基质(水族馆)
六方氮化硼
复合材料
纳米技术
地质学
物理
海洋学
量子力学
计算机科学
石墨烯
情报检索
作者
Shuai Jia,W. Chen,J. Zhang,Chenfang Lin,Hua Guo,Guangyuan Lu,K. Li,Tianyu Zhai,Qing Ai,Jun Lou
标识
DOI:10.1016/j.mtnano.2021.100135
摘要
Corrosion has been one of the most challenging long-term problems for many industry sectors. It accounts for more than half of the industrial failures and costs tens of billion dollars every year. Hexagonal boron nitride (h-BN), a chemically inert layered two-dimensional electrical insulator, which is stable at high temperature under an ambient environment, has been considered as a promising candidate for ultrathin protective coatings especially for harsh environments. In this work, we develop an efficient chemical vapor deposition (CVD) method to directly grow high quality, uniform, and large-area continuous h-BN thin films on industry-relevant stainless-steel substrate. During growth, the h-BN crystalline triangles merge together to form a large-area, voids-free, and continuous thin film on both flat and curved surfaces of stainless-steel substrates. The as-grown h-BN thin films could protect the stainless-steel substrates from oxidization under ambient condition at 800 °C and from corrosion in an extremely corrosive solution at both room and elevated temperatures.
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