偏苯三甲酸
化学
吸附
无机化学
金属有机骨架
拉曼光谱
过渡金属
分子
金属
电化学
物理化学
分析化学(期刊)
电极
有机化学
催化作用
物理
光学
作者
Philipp Schäfer,Anusha Lalitha,Paula Sebastián‐Pascual,Santosh Kumar Meena,Juan M. Feliú,Marialore Sulpizi,Monique A. Van Der Veen,Katrin F. Domke
标识
DOI:10.1016/j.jelechem.2017.01.025
摘要
We report the potential-dependent interactions of trimesic acid with Cu surfaces in EtOH. CV experiments and electrochemical surface-enhanced Raman spectroscopy show the presence of an adsorbed trimesic acid layer on Cu at potentials lower than 0 V vs Cu. The BTC coverage increases as the potential increases, reaching a maximum at 0 V. Based on molecular dynamics simulations, we report adsorption geometries and possible structures of the organic adlayer. We find that, depending on the crystal facet, trimesic acid adsorbs either flat or with one or two of the carboxyl groups facing the metal surface. At higher coverages, a multi-layer forms that is composed mostly of flat-lying trimesic acid molecules. Increasing the potential beyond 0 V activates the Cu-adsorbate interface in such a way that under oxidation of Cu to Cu2 +, a 3-D metal-organic framework forms directly on the electrode surface.
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