聚二甲基硅氧烷
降级(电信)
低聚物
断链
材料科学
大气温度范围
氢原子萃取
热的
硅
氢
均分解
化学工程
聚合物
高分子化学
化学
光化学
有机化学
纳米技术
复合材料
激进的
热力学
光电子学
工程类
物理
电信
计算机科学
作者
G. Camino,С. М. Ломакин,M. Lageard
出处
期刊:Polymer
[Elsevier BV]
日期:2002-03-01
卷期号:43 (7): 2011-2015
被引量:491
标识
DOI:10.1016/s0032-3861(01)00785-6
摘要
The products of the thermal degradation of polydimethylsiloxane (PDMS) are determined by the heating conditions, since two competing mechanisms are involved. Cyclic oligomers are formed in the low degradation temperature range and during slow heating in programmed degradation. This involves molecular splitting of oligomers from loop conformations of the PDMS chain favoured by its flexibility, and assistance on the part of empty silicon d-orbitals. Methane and oligomers are formed in the high temperature range and during fast heating. This shows that homolytic scission of Si–CH3 also takes place and is followed by hydrogen abstraction.
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