辐照
材料科学
光电子学
暗电流
通量
兴奋剂
探测器
分析化学(期刊)
平面的
砷化镓
电容
砷化铟镓
光学
物理
光电探测器
化学
电极
核物理学
色谱法
计算机图形学(图像)
量子力学
计算机科学
作者
Xing Huang,Tao Li,Xiumei Shao,L. Xue,Haimei Gong
摘要
Effect of γ-ray irradiations on the performance of InGaAs infrared detectors was studied. Planar-type 24×1 linear detector arrays were fabricated on n-InP/n-In0.53Ga0.47As/n-InP epitaxial structure by sealed-ampoule diffusion method. The InGaAs detectors were irradiated by 100krad, 300krad γ-ray at 40rad/s. The dark currents increased about 170%, 300% respectively and both decreased about 23% at the 8th hours and about 40% at the 22th hour after irradiation. Then the dark currents almost remained stable until 10 days after irradiation. Current-Voltage characteristics of the planar-type detector were analyzed. The current mechanisms were dominated by diffusion current, shunts current and generation-recombination current before irradiation. The γ irradiation resulted to increase these three current components. Ten days after irradiation, three current components all recovered partially. Capacitance-Voltage characteristics were measured before and after irradiation. Effective doping densities (Neff) of InGaAs layer were deduced by fitting 1/C2-V curves. Neff of detectors which were irradiated by 100krad γ-ray increased after irradiation and remained the same until 10 days after irradiation. Neff of detectors which were irradiated by 300krad γ-ray unchanged after irradiation. The response spectrums both moved slightly towards shorter wavelength after irradiation and stayed the same until at least 10 days after irradiation.
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