铝
化学
线性扫描伏安法
无机化学
氯化物
扩散
动力学
碱金属
循环伏安法
沉积(地质)
钨
电化学
分析化学(期刊)
电极
物理化学
色谱法
热力学
有机化学
古生物学
物理
生物
量子力学
沉积物
作者
R. Ødegård,Astrid Bjørgum,Å. Sterten,J. Thonstad,R. Tunold
标识
DOI:10.1016/0013-4686(82)80085-6
摘要
The kinetics of aluminium deposition from NaClAlCl3 and NaClKClAlCl3 melts (cAlCl3 < 0.4 mol%) was studied by linear sweep voltammetry and potential step amperometry. The reduction of AlCl3 on tungsten and aluminium electrodes was found to be diffusion controlled. The diffusion coefficients of AlCl3 were: 3.5 × 10−5 cm2 s−1 at 820°C in NaClAlCl3, 2.7 × 10−5cm2s−1 at 825°C, and 2.1 × 10−5cm2s−1 at 705°C in KClNaClAlCl3. The rate constant for AlCl3 reduction at these conditions was found to be in the order of 0.2 cm s−1, in good agreement with extrapolated literature data.
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