十八烷基三氯氢硅
单层
接触角
硅
化学气相沉积
材料科学
自组装单层膜
纳米技术
化学工程
硅烷
基质(水族馆)
X射线光电子能谱
化学
分析化学(期刊)
光电子学
有机化学
复合材料
工程类
海洋学
地质学
作者
Jinsheng Dong,Anfeng Wang,K. Y. Simon Ng,Guangzhao Mao
标识
DOI:10.1016/j.tsf.2006.07.041
摘要
Increasingly, organosilane self-assembled monolayers (SAMs) are used to modify the surfaces of silicon-based sensors and atomic force microscope (AFM) probes. Organosilane SAMs are preferred due to their fast and easy preparation, stability, and applicability to a wide range of substrates. The traditional dip coating method from solution often yields ill-defined particulate aggregates on the two-dimensional SAM. The presence of such three-dimensional aggregates seriously reduces the performance of miniaturized biosensor devices and AFM probes. It is difficult to control the amount of water in solution-based deposition. This paper describes a chemical vapor deposition (CVD) method to deposit octadecyltrichlorosilane (OTS) monolayers on silicon wafers and AFM probes under vacuum condition. OTS coated surfaces with static water contact angle ranging from 20° to 107° can be obtained by controlling the deposition conditions. The silicon substrates and AFM probes after CVD are characterized by AFM, X-ray photoelectron spectroscopy, Fourier transform infrared spectroscopy, and contact angle goniometry. The OTS monolayer is in a uniform low-density state below 65%. Above 65%, densely packed crystalline-like domains start to form. It takes 24 h to reach the adsorption saturation. The time span in the CVD deposition is much longer than the solution case and thus allowing precise variation of the substrate hydrophobicity for biosensor applications.
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