分子动力学
水分
腐蚀
从头算
材料科学
化学物理
从头算量子化学方法
计算化学
化学工程
化学
冶金
有机化学
复合材料
分子
工程类
作者
Anton Schneider,David A. Andersson,Yongfeng Zhang
标识
DOI:10.1038/s43246-024-00528-x
摘要
Abstract Molten salts are promising for various energy applications including fuel and solar cells and nuclear energy. These applications face a common challenge: corrosion of structural materials by impurities such as H 2 O. This work employs ab-initio molecular dynamics simulations to study H 2 O induced corrosion of FeCr alloys in molten NaF and NaCl salts. H 2 O is found highly stable in both salts, with infrequent, reversible dissociation into OH − and H + along with HF or HCl formation. The dissociation tendency correlates positively with the electronegativity and negatively with the size of halogen atoms. Accordingly, H 2 O reaches the salt/metal interface as a molecule before reacting with metal. Reduction of H + is found to occur without simultaneous oxidation of specific metal atoms such as Cr, suggesting sequential instead of the commonly proposed concurrent reduction and oxidation. The reduced H atoms prefer to stay at the interface and may re-enter NaF but not NaCl, highlighting the influence of salt chemistry.
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