单层
二次谐波产生
材料科学
薄膜
纳米技术
光学
物理
激光器
作者
Boxuan Zhou,J Kang,Bangyao Hu,Jingyuan Zhou,Huaying Ren,Jingxuan Zhou,Dehui� Zhang,Ao Zhang,Shuanghao Zheng,Chee Wei Wong,Yu Huang,Xiangfeng Duan
出处
期刊:Matter
[Elsevier]
日期:2024-05-17
卷期号:7 (7): 2448-2459
被引量:3
标识
DOI:10.1016/j.matt.2024.04.043
摘要
Monolayer molybdenum disulfide (MoS2) features exceptional second-order nonlinear optical (NLO) susceptibility, while being atomically thin limits its efficiency in second harmonic generation (SHG). The naturally existing 2H-phase MoS2 may offer a larger optical cross section in its bulk form but is inactive for SHG due to the restored centrosymmetry. Here, we report a thickness- and area-scalable bulk monolayer MoS2 (BM-MoS2) thin film for highly efficient SHG. The solution-assembled centimeter-scale BM-MoS2 consists of alternating monolayer MoS2 crystals and organic molecular layers that prevent interlayer coupling, thus preserving monolayer-like physical properties while achieving increased optical cross sections. The SHG studies demonstrate a giant SHG in BM-MoS2 that is 126 times higher than monolayer MoS2 and 21 times higher than gallium arsenide (GaAs), a material with the highest second-order NLO susceptibility among known bulk semiconductors. The facile assembly of BM-MoS2 thin films with efficient SHG offers a scalable pathway for developing ultrathin, efficient, and cost-effective NLO devices.
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