材料科学
腐蚀
电解质
点蚀
氯化物
冶金
衍射仪
电流密度
微观结构
光学显微镜
扫描电子显微镜
化学
复合材料
电极
物理
物理化学
量子力学
作者
Sung-Hwan Kim,Han‐Cheol Choe
出处
期刊:Corrosion science and technology
[The Corrosion Science Society of Korea]
日期:2012-10-31
卷期号:11 (5): 191-195
标识
DOI:10.14773/cst.2012.11.5.191
摘要
The aim of this study was to investigate effects of hafnium content on the corrosion behavior of Ti alloys in electrolyte containing chloride ion. For this study, Ti-Hf binary alloys contained 10 wt%, 20 wt% and 30 wt% Hf were manufactured in a vacuum arc-melting furnace and subjected to heat treatment for 12h at $1000^{\circ}C$ in an argon atmosphere. The pitting corrosion behavior of the specimens was examined through potentiodynamic and potentiostatic tests in 0.9 wt% NaCl electrolyte at $36.5{\pm}1^{\circ}C$. The corrosion morphology of Ti-xHf alloys was investigated using optical microscopy (OM) and X-ray diffractometer (XRD). From the optical microstructures and XRD results, needle-like martensite ($\alpha$') phases of the Ti-xHf alloys increased with an increase of Hf addition. Corrosion current density $(I_{corr})$ and current density $(I_{300mV})$ in passive region decreased, whereas, corrosion potential increased with Hf content. At the constant potential ($300mV_{SCE}$), current density decreased as time increased.
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