A novel nanosheet reconfigurable field effect transistor with dual-doped source/drain

—In this paper, a reconfigurable field-effect transistor (RFET) with dual-doped nanosheet architecture and triple independent gates is proposed and studied with the numerical simulations. The proposed RFET can behave as either an n/p-type MOSFET or an n/p-type tunneling-FET (TFET) according to different program biases. A comprehensive study is carried out on the device mechanism and the influence of key device parameters. Various metrics, such as the on-state current (ION), off-state current (IOFF), ION/IOFF, threshold voltage (VT) and sub-threshold swing (SS), are used to evaluate the proposed RFET. This RFET combining the advantages of the conventional MOSFETs (High ION and operation speed) and the new emerging TFETs (Low IOFF, sub-threshold swing and power dissipation) could make the circuit design more flexible and high efficiency, and improve the circuit performance.