Design and simulation of an extreme ultraviolet metalens based on the Pancharatnam–Berry phase

极紫外光刻 光学 极端紫外线 数值孔径 平版印刷术 计量学 材料科学 光电子学 物理 激光器 波长
作者
Xu Mao,Gang Yu,Yongmei Zhao,Bo Wei,Zhaofeng Li,Fuhua Yang,Xiaodong Wang
出处
期刊:Applied Optics [The Optical Society]
卷期号:63 (7): 1867-1867 被引量:1
标识
DOI:10.1364/ao.511899
摘要

Extreme ultraviolet (EUV) radiation plays a key role in the fields of material science, attosecond metrology, and lithography. However, the reflective optical components typically used in EUV systems contribute to their bulky size, weight, and increased costs for fabrication. In this paper, we theoretically investigate transmissive metalens designs capable of focusing the EUV light based on the Pancharatnam-Berry phase. The designed metalens is composed of nanoscale elliptical holes, which can guide and manipulate EUV light due to the higher refractive index of the vacuum holes compared to that of the surrounding material. We designed an EUV metalens with a diameter of 10 µm, which supports a focal length of 24 µm and a numerical aperture of up to 0.2. It can focus 55-nm EUV incident light to a diffraction-limited spot, and the focusing efficiency is calculated to be as high as about 7% over a broad EUV frequency range (50-65 nm). This study reveals the possibility of applying a dielectric metalens in the EUV region without a transmissive optical material.
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