极端紫外线
激光器
紫外线
材料科学
光电子学
光学
物理
作者
Tsukasa Sugiura,H. Yazawa,Hiroki Morita,Kazuyuki Sakaue,D. Nakamura,Eiji J. Takahashi,Atsushi Sunahara,G. O’Sullivan,Shinichi Namba,Takeshi Higashiguchi
摘要
We demonstrated an efficient extreme ultraviolet (EUV) source at a wavelength of 13.5 nm using spatially separated multiple solid-state-laser pulse irradiation. The maximum conversion efficiency (CE) achieved was 3.8% for ±30° oblique laser pulse injection, which was about twice as high as that for single laser pulse irradiation of 1.7%, with an EUV source size of about 100 μm for two spatially separated laser pulses with a total laser energy of 500 mJ at a laser intensity of 2×1011 W/cm2. In addition, we achieved an EUV CE of 4.7% for ±60° oblique laser pulse injection, which was one of the highest values ever reported, in the case of a 1-μm solid-state laser-produced planar Sn target plasma by multiple laser pulse irradiation. This result suggests that multiple laser-pulse irradiation at high repetition rate operation could credibly provide the next technology for future high-power EUV sources and exposure tools toward future EUV technology nodes.
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