溅射
材料科学
薄板电阻
氧化铟锡
透射率
溅射沉积
透明导电膜
太阳能电池
电阻率和电导率
分析化学(期刊)
铟
沉积(地质)
薄膜
电导率
异质结
光电子学
纳米技术
化学
图层(电子)
电气工程
沉积物
古生物学
色谱法
物理化学
工程类
生物
作者
Guoping Huang,Guixiang Zhao,Xixi Huang,Hao Zhuang,Zhongjian Zhang,Ronggang Gao,Fengxian Xie
摘要
TCO (transparent conductive oxide) films are widely used in solar cells due to the characteristics of transparency and conductivity. In this paper, ITO (indium tin oxide) transparent conductive films are prepared on common slides by DC magnetron sputtering, and the preparation process and characteristics of ITO films are studied. The target for sputtering is ITO, with the mass ratio of In203 and Sn02 was 90% : 10%. The sheet resistance, carrier concentration, and carrier mobility of ITO films are measured and analyzed by a UV-Vis spectrophotometer, four-point probe, and Hall effect measurement system. By changing the oxygen content, deposition temperature, and sputtering power to studied the effects on the light transmittance and electrical conductivity of the ITO films, further studied the effects on the HJT (heterojunction with intrinsic thin film) solar cells, and finally determined the appropriate preparation parameters. Results show that the resistance is , the light transmittance is beyond 90.6%, efficiency is 23.78%, and bifacial ratio is 84% when oxygen content is 2.2%, sputtering power is 3 kw, and deposition temperature is 190°C.
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