等离子体子
异质结
材料科学
接口(物质)
电荷(物理)
金属
金属有机骨架
纳米技术
光电子学
化学物理
分子
化学
吸附
有机化学
物理化学
物理
量子力学
冶金
吉布斯等温线
作者
Shuobo Wang,Daojian Tang,Yuchao Zhang,Jincai Zhao
标识
DOI:10.1002/cphc.202200565
摘要
Abstract Plasmon‐excited hot carriers have drawn great attention for driving various chemical reactions, but the short lifetimes of hot carriers seriously restrict the performance of plasmonic photocatalysis. Constructing plasmonic metal/metal‐organic framework (MOF) heterostructures has been proved as an effective strategy to extend the lifetimes of hot carriers. Due to the high molecular tunability of MOFs, the MOF substrate in plasmonic metal/MOF heterostructures is able to capture hot electrons on the conduction band of MOF and hot holes on its valence band, and thus offers an ideal platform to separately study the detailed mechanism of hot electron and hole transfer processes. This review focuses on a molecular‐level understanding of both hot‐electron and hot‐hole transfer at plasmonic metal/MOF interfaces. The enhanced stability and photocatalytic performance by introducing MOF substrates are discussed for plasmonic metal/MOF heterostructures. Additionally, typical characterization technologies are also proposed as powerful tools for tracking hot carrier transfer process.
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