Effect of carbon doping on threshold voltage and mobility of In-Si-O thin-film transistors

材料科学 薄膜晶体管 阈值电压 无定形固体 兴奋剂 溅射 表面粗糙度 退火(玻璃) 电子迁移率 分析化学(期刊) 薄膜 光电子学 晶体管 纳米技术 结晶学 复合材料 电压 图层(电子) 电气工程 化学 工程类 色谱法
作者
Kazunori Kurishima,Toshihide Nabatame,Nobuhiko Mitoma,Takio Kizu,Shinya Aikawa,Kazuhito Tsukagoshi,Akihiko Ohi,Toyohiro Chikyow,Atsushi Ogura
出处
期刊:Journal of vacuum science and technology [American Vacuum Society]
卷期号:36 (6) 被引量:5
标识
DOI:10.1116/1.5039665
摘要

In this study, a co-sputtering method with In2O3 and SiC targets was used to fabricate carbon-doped In-Si-O (In1-xSixO1-yCy) as the channel material for oxide thin-film transistors (TFTs). Three types of In1-xSixO1-yCy channels, namely, In0.88Si0.12O0.99C0.01 (Si0.12C0.01), In0.76Si0.24O0.99C0.01 (Si0.24C0.01), and In0.60Si0.40O0.98C0.02 (Si0.40C0.02), were prepared. After annealing at 300 °C, the Si0.24C0.01 and Si0.40C0.02 films retained an amorphous structure, while the Si0.12C0.01 films exhibited a body-centered-cubic structure. However, all the In1-xSixO1-yCy films maintained a smooth surface with a root-mean-square roughness of approximately 0.28 nm, despite structural differences. Results showed that the conductivities of all the In1-xSixO1-yCy films were not sensitive to the O2 partial pressure during sputtering, indicating that In1-xSixO1-yCy films exhibit more stable electrical conductivity than other InOx-based oxides. The field-effect mobility (μFE) with respect to the Si concentration of In1-xSixO1-yCy and In1-xSixO TFTs showed very similar behavior. In contrast, the threshold voltage (Vth) behavior of the two types varied dramatically, with the In1-xSixO TFTs Vth value increasing drastically from −57.7 to 9.7 V with increasing Si concentration, and the Vth of In1-xSixO1-yCy TFTs increasing only gradually from −9.2 to 2.4 V. This indicates that incorporated carbon has a significant effect on Vth at a low Si concentration due to strong C—O bond formation. The highest bond dissociative energy occurs between O and C atoms in the In1-xSixO1-yCy channel. The amount of oxygen vacancy in Si0.12C0.01, Si0.24C0.01, and Si0.40C0.02 was 18.9%, 13.3%, and 12.9%, respectively. As a result, the Si0.12C0.01 TFT exhibited superior transistor properties of Vth = −9.2 V while maintaining a μFE of 32.4 cm2/Vs. Therefore, an In1-xSixO1-yCy film is significantly advantageous as a channel material for oxide TFTs given that it can result in mobility exceeding 30 cm2/Vs.

科研通智能强力驱动
Strongly Powered by AbleSci AI
科研通是完全免费的文献互助平台,具备全网最快的应助速度,最高的求助完成率。 对每一个文献求助,科研通都将尽心尽力,给求助人一个满意的交代。
实时播报
莫非完成签到,获得积分10
1秒前
无能的丈夫完成签到,获得积分10
1秒前
渤大小mn完成签到,获得积分10
2秒前
2秒前
Aki_27完成签到,获得积分10
2秒前
渔渔完成签到 ,获得积分10
2秒前
Yeee完成签到,获得积分10
2秒前
要开心完成签到,获得积分10
2秒前
关心完成签到,获得积分10
3秒前
3秒前
3秒前
ganyu59完成签到,获得积分10
3秒前
fangy34完成签到,获得积分10
4秒前
机智绝悟完成签到,获得积分10
4秒前
JackWu发布了新的文献求助10
4秒前
健康的鸽子完成签到,获得积分10
5秒前
看不懂发布了新的文献求助10
5秒前
典雅的阑悦完成签到,获得积分10
5秒前
昏睡的飞雪完成签到,获得积分10
5秒前
5秒前
听风说话吖完成签到 ,获得积分10
6秒前
lanjq兰坚强完成签到,获得积分10
6秒前
zgrmws应助张瀚文采纳,获得10
7秒前
li完成签到 ,获得积分10
7秒前
阿洁完成签到,获得积分20
7秒前
chx123发布了新的文献求助20
7秒前
量子星尘发布了新的文献求助10
8秒前
孤独听雨的猫完成签到 ,获得积分10
8秒前
8秒前
月亮夏的夏完成签到,获得积分20
8秒前
11111111111完成签到,获得积分10
9秒前
10秒前
10秒前
10秒前
鸣蜩阿六完成签到,获得积分10
10秒前
每天都想喝奶茶完成签到 ,获得积分10
10秒前
田様应助yjq采纳,获得10
11秒前
Riggle G完成签到,获得积分10
12秒前
胡佳文完成签到,获得积分10
12秒前
聪明铸海完成签到,获得积分10
12秒前
高分求助中
(应助此贴封号)【重要!!请各用户(尤其是新用户)详细阅读】【科研通的精品贴汇总】 10000
Encyclopedia of Reproduction Third Edition 3000
Comprehensive Methanol Science Production, Applications, and Emerging Technologies 2000
From Victimization to Aggression 1000
化妆品原料学 1000
小学科学课程与教学 500
Study and Interlaboratory Validation of Simultaneous LC-MS/MS Method for Food Allergens Using Model Processed Foods 500
热门求助领域 (近24小时)
化学 材料科学 生物 医学 工程类 计算机科学 有机化学 物理 生物化学 纳米技术 复合材料 内科学 化学工程 人工智能 催化作用 遗传学 数学 基因 量子力学 物理化学
热门帖子
关注 科研通微信公众号,转发送积分 5645277
求助须知:如何正确求助?哪些是违规求助? 4768340
关于积分的说明 15027650
捐赠科研通 4803859
什么是DOI,文献DOI怎么找? 2568523
邀请新用户注册赠送积分活动 1525813
关于科研通互助平台的介绍 1485484