Photosensitive Polyimide Siloxane

A photosensitive silicone polyamic acid is described. This material is easily prepared directly from the precursor silicone polyamic acid. Properties and characteristics of this polymer system are discussed including handling, use, and practical photochemistry. Thermal tempering of the photosensitive or crosslinked polymer gives the polyimide siloxane which has been previously shown to be an excellent candidate as an insulating polymer in electronics. The use of such a directly patternable polyimide for dielectric and passivation applications, particularly in microelectronics, should become increasingly important as polyimides become more widely accepted in the industry.