材料科学
薄脆饼
溅射
溅射沉积
基质(水族馆)
半最大全宽
微晶
薄膜
光电子学
产量(工程)
表面粗糙度
位错
复合材料
纳米技术
冶金
海洋学
地质学
作者
Zhengwang Cheng,Aobo Wang,Huating Bo,Mei Wang,Jing He,Wei Zou,Xinguo Ma
标识
DOI:10.1021/acs.cgd.2c01188
摘要
As a kind of important strategic resource, molybdenum (Mo) and its alloys are widely applied in solar cells and 5G radio frequency filters. In order to improve the yield of industrial production, it is important to reduce the nonuniformity of thin-film thickness. We prepared Mo films on CMOS compatible Si/SiO2 wafers through a magnetron sputtering method and systematically investigated the effect of tuning of several process parameters on film thickness nonuniformity and other structural properties, including crystallite size (D), microstrain (ε), and dislocation density (δ). At optimized sputtering power (80 W), chamber pressure (0.4 Pa), argon flow rate (90 sccm), substrate temperature (350 °C), and target–substrate distance (9 cm), the deposited 200 nm-thick Mo films show a unified <110> preferred orientation, and the film thickness nonuniformity reaches an excellent value of 0.46%, with a surface roughness of 0.83 nm and the full width at half maximum (FWHM) of X-ray diffraction (XRD) (110) rocking curve as low as 0.47°. Our results provide efficient reference for the preparation of uniform metal films, which have potential for improving the quality and yield in filter device manufacturing.
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