反铁磁性
签名(拓扑)
凝聚态物理
三元运算
挫折感
材料科学
物理
计算机科学
数学
几何学
程序设计语言
作者
Kavita Yadav,P Koushik,Saurabh Singh,Masato Hagihala,K. Mukherjee
出处
期刊:Physical review
[American Physical Society]
日期:2024-06-06
卷期号:109 (22)
被引量:2
标识
DOI:10.1103/physrevb.109.224409
摘要
Determining the fundamental mechanisms that are responsible for the observed anomalies in electrical transport is a key objective in condensed matter physics. Among these, quantum interference effects such as electron-electron (e-e) interaction and weak localization (WL) effects play an important role in determining the low-temperature ($T$) electrical transport behavior in disordered systems. Here, we provide experimental evidence for the observation of quantum interference effects driven low-temperature resistivity (\ensuremath{\rho}) minima in HoScSi and ErScSi. Temperature dependent magnetic and neutron diffraction studies clearly establish that HoScSi undergoes a transition from a paramagnetic to a commensurate antiferromagnetic (AFM) state near ${T}_{1\mathrm{Ho}}\ensuremath{\sim}57$ K, which decreases to 28 K (${T}_{1\mathrm{Er}}$) in ErScSi. Furthermore, in HoScSi, an incommensurate AFM state is observed below \ensuremath{\sim}35 K. Additionally, cluster glass phases are also noted in both intermetallics at lower $T$, which coexist with the antiferromagnetic state. These observed features have been attributed to the presence of ferromagnetic (FM) and AFM exchange interactions. In addition to this, \ensuremath{\rho} minima are noted near 20 K (${T}_{\mathrm{minHo}}$) and 18 K (${T}_{\mathrm{minEr}}$) in HoScSi and ErScSi, respectively. The systematic analysis of the magnetic field and $T$ dependence of \ensuremath{\rho} indicates that the observed anomaly originates from a disorder-enhanced e-e interaction and the WL effect.
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