电负性
合金
核心电子
材料科学
结合能
无定形固体
Crystal(编程语言)
X射线光电子能谱
结晶学
锗
电子
硅
分析化学(期刊)
原子物理学
单晶
化学
冶金
核磁共振
物理
有机化学
色谱法
程序设计语言
计算机科学
量子力学
作者
Mostafa Arghavani,R. Braunstein,Gordon Chalmers,D Shirun,Ping Yang
标识
DOI:10.1016/0038-1098(89)90544-9
摘要
Abstract The binding energies of the Ge 3d and Si 2p core electrons in single crystal GeSi alloys were studied by x-ray photoelectron spectroscopy (XPS). It was found that up to the instrumental resolution neither the energy position nor the line shapes change as the alloy composition is varied. This in turn puts a limit on the electronegativity of Ge and Si and consequently on the electron charge transfer between the two atoms in the alloy. The results are discussed and compared to similar measurements on sputtered grown amorphous GeSi alloys.
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