The chemical composition and bonding structure of amorphous hydrogenated carbon nitride film on aluminum surface deposited by electrodeposition

Abstract Amorphous hydrogenated carbon nitride films with excellent adhesion to the substrates were deposited on the surfaces of aluminum plates by electrodeposition with acetonitrile as carbon source. The as‐obtained films were detailed characterized by Raman, XPS and FTIR. The results show that the as‐obtained films are mainly made up of sp2 C, sp3 C, CN, CN bonds and a spot of sp3CH 2 , sp3CH 3 , sp3CH and sp2CH bonds. The atomic ratio of N/C is evaluated to be about 2.98 at.% by XPS. Raman analysis indicated that I D / I G ratios decreased from 0.827 to 0.675 when the deposition time increased from 10 to 20 h. At the end, on the basis of the detailed analysis, results of Raman, FTIR and XPS, the possible deposition mechanism was discussed. Copyright © 2010 John Wiley & Sons, Ltd.