Developments of EUV/x-ray wavefront sensors and adaptive optics at Imagine Optic

Imagine Optic (IO) is actively developing EUV to X-ray wavefront (WF) sensors since 2003 for applications on metrology of EUV to X-ray beams emitted by synchrotrons, free-electron lasers, plasma-based soft X-ray lasers and high harmonic generation. Our sensors have demonstrated their high usefulness for metrology of EUV to X-ray optics from single flat or curved mirrors to more complex optical systems (Schwarzschild, Kirkpatrick-Baez static or based on bender technology or with activators). Our most recent developments include the realization of a EUV sensor adapted to strongly convergent or divergent beams having numerical aperture as high as 0.15, as well as the production of a hard X-ray sensor working at 10 keV and higher energies, providing repeatability as good as 4 pm rms. We present a review of the developed sensors, as well as experimental demonstrations of their benefits for various metrology and WF optimization requirements.