氧烷
X射线光电子能谱
材料科学
薄膜
无定形固体
无定形碳
分析化学(期刊)
光谱学
氮化碳
吸收光谱法
X射线吸收精细结构
化学
结晶学
纳米技术
光学
核磁共振
有机化学
物理
量子力学
光催化
催化作用
作者
Niklas Hellgren,Jinghua Guo,Yi Luo,Conny Såthe,Akane Agui,Stepan Kashtanov,J. Nordgren,Hans Ågren,J.‐E. Sundgren
标识
DOI:10.1016/j.tsf.2004.03.027
摘要
Magnetron-sputtered carbon nitride thin films with different structures and compositions were analyzed by X-ray and ultraviolet photoelectron spectroscopy (XPS and UPS), near-edge X-ray absorption fine structure spectroscopy (NEXAFS), as well as X-ray emission spectroscopy (XES). In all techniques, the carbon spectra are broad and featureless with little variation depending on growth conditions. The nitrogen spectra, on the other hand, show more distinct features, providing a powerful tool for structural characterization. By comparing the experimental spectra with calculations on different model systems, we are able to identify three major bonding structures of the nitrogen—N1: nitrile (CN) bonds; N2: Pyridine-like N, i.e., N bonded to two C atoms; and N3: graphite-like N, i.e., N bonded to three C atoms as if substituted in a graphitic network, however, possibly positioned in a pentagon and/or with sp3 carbon neighbors. The presence of N2 and N3 are best detected by XPS, while N1 is better detected by NEXAFS. The calculated XES spectra also give good indications how valence band spectra should be interpreted. Films grown at the higher temperatures (≥350 °C) show a pronounced angular dependence of the incoming photon beam in NEXAFS measurements, which suggests a textured microstructure with standing graphitic basal planes, while amorphous films grown at low temperatures show isotropic properties.
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