掺杂剂
纳米晶材料
兴奋剂
材料科学
电阻率和电导率
三元运算
氧化铟锡
塞贝克系数
微晶
锡
铟
氧气
氧化物
分析化学(期刊)
无机化学
薄膜
纳米技术
化学
光电子学
冶金
计算机科学
物理
热导率
有机化学
复合材料
程序设计语言
色谱法
量子力学
作者
Jin‐Ha Hwang,Doreen D. Edwards,Daniel R. Kammler,Thomas O. Mason
标识
DOI:10.1016/s0167-2738(99)00321-5
摘要
In-based transparent conducting oxides (TCOs) share the prevailing defect structure of indium–tin oxide (ITO), i.e. electrons, isolated SnIn⋅ donors, and neutral associates, believed to be (2SnIn⋅Oi″)x. The present work reviews the state of the literature, presents calculated Brouwer diagrams vs. oxygen partial pressure and vs. dopant concentration, and reports intermediate temperature electrical property data (thermopower, conductivity) vs. pO2 and Sn concentration for three systems — polycrystalline bulk ITO, nanocrystalline ITO, and the recently reported ternary cation TCO, Ga3−xIn5+xSn2O16. The influence of non-reduceable tin–oxygen complexes at high doping levels is identified for ITO. Ramifications for In-based TCO properties are discussed.
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