降级(电信)
热载流子注入
阈值电压
负偏压温度不稳定性
晶体管
栅氧化层
作者
Chenming Hu,S. Tam,Fu-Chieh Hsu,P.K. Ko,Tung-Yi Chan,K.W. Terrill
出处
期刊:IEEE Journal of Solid-state Circuits
[Institute of Electrical and Electronics Engineers]
日期:1985-01-01
卷期号:20 (1): 295-305
被引量:169
标识
DOI:10.1109/jssc.1985.1052306
摘要
Evidence suggests that MOSFET degradation is due to interface-states generation by electrons having 3.7 eV and higher energies. This critical energy and the observed time dependence is explained with a physical model involving the breaking of the = Si/sub s/H bonds. The device lifetime /spl tau/ is proportional to...
科研通智能强力驱动
Strongly Powered by AbleSci AI