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Multi-pass cells for post-compression of ultrashort laser pulses

超短脉冲 激光器 皮秒 光电子学 材料科学 光学 飞秒 放大器 钛宝石激光器 计算机科学 物理 蓝宝石 CMOS芯片
作者
Anne‐Lise Viotti,Marcus Seidel,Esmerando Escoto,Supriya Rajhans,Wim Leemans,Ingmar Hartl,Christoph M. Heyl
出处
期刊:Optica [Optica Publishing Group]
卷期号:9 (2): 197-197 被引量:81
标识
DOI:10.1364/optica.449225
摘要

Ultrafast lasers reaching extremely high powers within short fractions of time enable a plethora of applications. They grant advanced material processing capabilities, are effective drivers for secondary photon and particle sources, and reveal extreme light-matter interactions. They also supply platforms for compact accelerator technologies, with great application prospects for tumor therapy or medical diagnostics. Many of these scientific cases benefit from sources with higher average and peak powers. Following mode-locked dye and titanium-doped sapphire lasers, broadband optical parametric amplifiers have emerged as high peak- and average power ultrashort pulse lasers. A much more power-efficient alternative is provided by direct post-compression of high-power diode-pumped ytterbium lasers—a route that advanced to another level with the invention of a novel spectral broadening approach, the multi-pass cell technique. The method has enabled benchmark results yielding sub-50-fs pules at average powers exceeding 1 kW, has facilitated femtosecond post-compression at pulse energies above 100 mJ with large compression ratios, and supports picosecond to few-cycle pulses with compact setups. The striking progress of the technique in the past five years puts light sources with tens to hundreds of TW peak and multiple kW of average power in sight—an entirely new parameter regime for ultrafast lasers. In this review, we introduce the underlying concepts and give brief guidelines for multi-pass cell design and implementation. We then present an overview of the achieved performances with both bulk and gas-filled multi-pass cells. Moreover, we discuss prospective advances enabled by this method, in particular including opportunities for applications demanding ultrahigh peak-power, high repetition rate lasers such as plasma accelerators and laser-driven extreme ultraviolet sources.
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