抛光
磁流变液
磁场
材料科学
平面(几何)
旋转磁场
结构工程
机械
机械工程
工程类
物理
数学
几何学
量子力学
作者
Huazhuo Liang,Qiusheng Yan,Jisheng Pan,Bin Luo,Jiabin Lu,Xiaowei Zhang
出处
期刊:Journal of Testing and Evaluation
[ASTM International]
日期:2019-05-06
卷期号:49 (1): 255-269
被引量:5
摘要
Abstract Aiming at the process of magnetorheological (MR) polishing, we analyzed the characteristics of polishing forces (normal force [Fn] and tangential force [Ft]) in a machining process by using the Kistler 9171A 3-d rotating dynamometer. The influences of rotation speeds of magnetic poles and the workpiece, abrasive concentration, concentration of carbonyl iron powders, working gaps, and deflection distance of the workpiece on MR polishing forces with dynamic magnetic fields were investigated. The results showed that polishing forces of polishing pads with static magnetic fields were significantly attenuated. For MR polishing pads under a dynamic magnetic field, polishing force signals showed remarkable changes in dynamic stability. Polishing forces Fn and Ft decreased with the increased rotation speeds of the workpiece and working gaps, increased with concentrations of abrasives and carbonyl iron powders, and slightly increased with the deflection distance of the workpiece.
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