极紫外光刻
材料科学
极端紫外线
发射率
涂层
压力(语言学)
芯(光纤)
光学
热的
传输(电信)
热冲击
光电子学
图层(电子)
复合材料
物理
计算机科学
电信
哲学
语言学
气象学
激光器
作者
Eun‐Sang Park,Chung-Hyun Ban,Hye-Keun Oh,Jae‐Hun Park
摘要
The analysis of the thermal stress and the extreme-ultraviolet (EUV) pellicle is important since the pellicle could be easily damaged since the thickness of the pellicle is 50 nm thin due to 90% required EUV transmission. One of the solution is using a high emissivity metallic material on the both sides of the pellicle and it can lower the thermal stress. However, using a metallic coating on pellicle core which is usually consist of silicon group can decrease the EUV transmission compared to using a single core layer pellicle only. Therefore, we optimized thermal and optical properties of the pellicle and elect three types of the pellicle. In this paper we simulated our optimized pellicles with 500W source power. The result shows that the difference of the thermal stress is small for each case. Therefore, our result also shows that using a high emissivity coating is necessary since the cooling of the pellicle strongly depends on emissivity and it can lower the stress effectively even at high EUV source power.
科研通智能强力驱动
Strongly Powered by AbleSci AI