热传导
钙钛矿(结构)
电阻随机存取存储器
电压
欧姆接触
材料科学
电极
化学物理
光电子学
记忆电阻器
导电体
空间电荷
纳米技术
凝聚态物理
化学
电子
图层(电子)
电子工程
电气工程
结晶学
物理
复合材料
物理化学
量子力学
工程类
作者
Uyen Tu Thi Doan,Duy Khanh Le,Truong Lam Huynh,Tung Thanh Ngo,Trieu Quang Vo,M. Thi,Anh Tuấn Thanh Phạm,Vinh Cao Trần,Phuong Tuyet Nguyen,Ngoc Kim Pham
标识
DOI:10.1002/cphc.202300210
摘要
In this study, the features of resistive random access memory (RRAM) employing a straightforward Cr/MAPbI3 /FTO three-layer structure have been examined and clarified. The device displays various resistance switching (RS) behavior at various sweep voltages between 0.5 and 5 V. The RS effect has a conversion in the direction of the SET and RESET processes during sweeping for a number of cycles at a specific voltage. The directional change of the RS processes corresponds to the dominant transition between the generation/recombination of iodide ion and vacancy in the MAPbI3 perovskite layer and the electrochemical metallization of the Cr electrode under the influence of an electric field, which results in the conductive filament (CF) formation/rupture. At each stage, these processes are controlled by specific charge conduction mechanisms, including Ohmic conduction, space-charge-limited conduction (SCLC), and variable-range hopping (VRH). By identifying the biased voltage and the quantity of voltage sweep cycles, one can take a new approach to control or modulate the pathways for effective charge transport. This new approach is made possible by an understanding of the RS characteristics and the corresponding mechanisms causing the variation of RS behavior in the structure.
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