外延
化学气相沉积
材料科学
半导体
碲
云母
延伸率
电子迁移率
纳米技术
光电子学
沉积(地质)
凝聚态物理
物理
复合材料
图层(电子)
古生物学
沉积物
生物
冶金
极限抗拉强度
作者
Jie Li,Junrong Zhang,Junwei Chu,Yang Liu,Xinxin Zhao,Yan Zhang,Tong Liu,Yang Lü,Cheng Chen,Xingang Hou,Fang Long,Yi‐Jun Xu,Junyong Wang,Kai Zhang
出处
期刊:iScience
[Elsevier]
日期:2023-02-10
卷期号:26 (3): 106177-106177
被引量:4
标识
DOI:10.1016/j.isci.2023.106177
摘要
As an elemental semiconductor, tellurium (Te) has been famous for its high hole-mobility, excellent ambient stability and topological states. Here, we realize the controllable synthesis of horizontal Te nanoribbon arrays (TRAs) with an angular interval of 60°on mica substrates by physical vapor deposition strategy. The growth of Te nanoribbons (TRs) is driven by two factors, where the intrinsic quasi-one-dimensional spiral chain structure promotes the elongation of their length; the epitaxy relationship between [110] direction of Te and [110] direction of mica facilitates the oriented growth and the expansion of their width. The bending of TRs which have not been reported is induced by grain boundary. Field-effect transistors based on TRs demonstrate high mobility and on/off ratio corresponding to 397 cm2 V-1 s-1 and 1.5×105, respectively. These phenomena supply an opportunity to deep insight into the vapor-transport synthesis of low-dimensional Te and explore its underlying application in monolithic integration.
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