荧光
硼
抗菌剂
材料科学
形状记忆合金
化学
纳米技术
高分子化学
化学工程
有机化学
复合材料
光学
工程类
物理
作者
Ruilu Guo,Wen‐Ning Qi,Huibiao Liu,D. J. Li,Guangxin Chen,Qifang Li,Zheng Zhou
标识
DOI:10.1016/j.cej.2024.149850
摘要
Developing a shape memory polysiloxanes possessing superior mechanical properties, antibacterial qualities, and exceptional self-healing capabilities has become a significant obstacle for the development of smart materials. We tackled this challenge by modifying polysiloxanes using N-acetylcysteine (NACL) and photosensitive molding with a dynamic borate ester crosslinker (S-BDB). The resultant photosensitive polysiloxane exhibited remarkable mechanical properties, with a stress up to 4.7 MPa. By utilizing the hydrogen bonds of grafted NACL and dynamic borate ester bonds of S-BDB to heal the damaged polymer network, the efficient self-healing performance (99.2 %) of photosensitive polysiloxane was obtained. Additionally, the material exhibited typical shape memory properties due to the rapid exchange of hydrogen bonds at elevated temperatures and the fixation of borate esters, enabling shape editing of the material. The material obtained a phosphorescent effect due to the introduction of B-O bonding, making it possible to have application value in the field of complex pattern fluorescent anti-counterfeiting marking manufacturing. Simultaneously, due to the amphiphilic ionic nature of NACL, the resin material obtained exhibited excellent antimicrobial properties.
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