Advances in Quantum Dot Direct Photolithographic Patterning

Quantum Dots (QDs) with unique electrical and optical properties have wide applications on patterned or pixelated devices such as display devices, integrated photoelectric devices, etc. However, conventional patterning methods have some obvious drawbacks such as complex processing, blurred film boundaries, and degradation on the photophysical properties. Recently, direct photolithographic patterning has appeared as a novel strategy to realize high-resolution patterning solids and high-performance patterned devices. In this review, we summarize the research progress on the direct photolithographic patterning on QDs as well as their applications. We also discuss the current challenges and future development in this field.