乙二胺
化学
铜
无机化学
金属
硫脲
酒石酸盐
柠檬酸三钠
配体(生物化学)
电镀(地质)
沉积(地质)
配合物的稳定常数
基质(水族馆)
镀铜
离子
核化学
电镀
有机化学
图层(电子)
古生物学
生物化学
受体
沉积物
地球物理学
生物
地质学
海洋学
作者
Tao Jiang,Jiajia Wan,Yuting Zong,Chengmei Gui,Zhenming Chen,Junjun Huang
出处
期刊:Langmuir
[American Chemical Society]
日期:2024-07-22
卷期号:40 (31): 16283-16290
标识
DOI:10.1021/acs.langmuir.4c01455
摘要
Electroless plating facilitates the metallization of nonconductive substrate surfaces, and of note, the precise control of the bath stability constant influences the deposition process of metal particles. In this paper, trisodium citrate, potassium sodium tartrate, nitrogen triacetic acid, thiourea, and ethylenediamine tetraacetic acid disodium were selected as coordination agents, and the effect of the metal ion ligand stability constant on the reduction deposition was studied. Coordination bonds can be established between the Cu
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