作者
Ingrid Repins,Lorelle M. Mansfield,Ana Kanevce,Soren A. Jensen,Darius Kuciauskas,Stephen Glynn,Teresa M. Barnes,Wyatt K. Metzger,James M. Burst,Chun-Sheng Jiang,Patricia C. Dippo,Steve Harvey,Glenn Teeter,Craig L. Perkins,Brian Egaas,Andriy Zakutayev,Jan-Hendrik Alsmeier,Thomas Lusky,Lars Korte,Regan G. Wilks,Marcus Bär,Yanfa Yan,Stephan Lany,Pawel Zawadzki,Ji-Sang Park,Su-Huai Wei
摘要
Band-edge effects — including grading, electrostatic fluctuations, bandgap fluctuations, and band tails — affect chalcogenide device efficiency. These effects now require more careful consideration as efficiencies increase beyond 20%. Several aspects of the relationships between band-edge phenomena and device performance for NREL absorbers are examined. For Cu(In, Ga)Se2 devices, recent increases in diffusion length imply changes to the optimum bandgap profile. The origin, impact, and modification of electrostatic and bandgap fluctuations are also discussed. The application of the same principles to devices based on CdTe, kesterites, and emerging absorbers (Cu 2 SnS 3 , CuSbS 2 ), considering differences in materials properties, is examined.