抛光
钻石
材料科学
辐照
表面粗糙度
紫外线
Crystal(编程语言)
单晶
表面光洁度
复合材料
光学
光电子学
结晶学
化学
计算机科学
物理
核物理学
程序设计语言
作者
Satoru Anan,Mutsumi Touge,Akihisa Kubota,Junji Watanabe
出处
期刊:Key Engineering Materials
日期:2009-02-20
卷期号:407-408: 355-358
被引量:9
标识
DOI:10.4028/www.scientific.net/kem.407-408.355
摘要
The ultraviolet irradiation-assisted ultra precision polishing was performed on single crystal diamond substrates. This polishing method has been newly developed in our laboratory. The change of polishing performances was investigated by the presence of the UV irradiation. The polished surfaces were evaluated by the observation with WYKO. The experimental results are as follows; Surface roughness of diamond substrates polished under UV irradiation has become clearly smoother than that without UV irradiation. The surface roughness by this polishing method was reached to be 0.19 nm Ra on (100) surface of single crystal diamond. The equivalent surface was obtained on (110) surface by the UV-polishing.
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