材料科学
基质(水族馆)
光电子学
热导率
宽禁带半导体
复合数
氮化镓
皮秒
热的
图层(电子)
复合材料
光学
激光器
海洋学
物理
气象学
地质学
作者
Jungwan Cho,Yiyang Li,David Altman,W. E. Hoke,Mehdi Asheghi,Kenneth E. Goodson
标识
DOI:10.1109/csics.2012.6340094
摘要
We report the temperature dependent thermal properties of two types of GaN composite substrates (GaN-SiC and GaN-Si) using picosecond time-domain thermoreflectance (TDTR). The intrinsic thermal conductivity of the GaN buffer film decreases with increasing temperature, while the GaN-substrate thermal interface resistance (TIR) increases with increasing temperature. The strong temperature dependence of the GaN-substrate TIR suggests that microstructural defects within the AlN transition film and near its boundaries can be particularly important.
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