Synthesis of crystalline C3N4 by MPCVD

In this study, carbon nitride thin films are synthesized on Si and Pt substrates by microwave plasma chemical vapor deposition (MPCVD). The major part of the films is composed of α-C3N4 and β-C3N4. XPS and FT-IR spectra strongly support the existence of C–N covalent bonds in C3N4. Raman spectra also support the existence of β-C3N4. The carbon nitride films on Pt substrates have a high bulk modulus of 349 GPa.