The deposition of TiN at less than 150 °C by reactive magnetron sputter ion plating

Abstract Thin films of TiN were deposited onto polycarbonate platelets at low temperatures. The effect of deposition parameters on the adhesion, stress cracking, deposition temperature and appearance of these films was studied using a designed experimental approach. Substrate heating as a result of the magnetron plasma was the primary sources of high substrate temperatures during deposition. TiN layer stress was reduced by decreasing magnetron deposition power and increasing deposition pressure. Improved adhesion to polycarbonate was achieved by admitting 10% (by volume) of oxygen during the formation of the titanium interface region. The coating of TiN onto polycarbonate improved the abrasive wear properties and the appearance of the substrate.