无定形固体
溅射
化学计量学
微晶
分析化学(期刊)
薄膜
材料科学
基质(水族馆)
沉积(地质)
溅射沉积
化学
结晶学
纳米技术
冶金
物理化学
生物
海洋学
地质学
色谱法
古生物学
沉积物
作者
Massimo Di Giulio,A. Zappettini,L. Nasi,Silvia Maria Pietralunga
标识
DOI:10.1002/crat.200410479
摘要
Abstract Amorphous stoichiometric thin films of TeO 2 have been successfully grown by reactive rf‐sputtering deposition. The proper choice of deposition parameters such as the rf power, the Ar/O 2 composition and pressure of the sputtering gas, the substrate temperature, enabled us to obtain TeO x films of different thickness (up to 2.4 µm) with constant and reproducible optical and structural characteristics. The x value was calculated from RBS measurements to be equal to 2.04 ± 0.08 and all films showed good optical transparency in the visible and near infrared range. The structure of the films was studied by XRD, TEM and SAD, and it was found to be amorphous with the presence of rare and small Te crystallites. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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