The Effect of La on the Surface Properties of Plasma Nitrided CoCrCuFeNi High-Entropy Alloys at 440 Degrees Celsius

渗氮 材料科学 扫描电子显微镜 压痕硬度 腐蚀 高熵合金 冶金 合金 硬化(计算) 硬度 等离子体 表层 微观结构 等离子体浸没离子注入 图层(电子) 分析化学(期刊) 复合材料 离子 离子注入 化学 有机化学 色谱法 物理 量子力学
作者
Yifan Wang,Yuan You,Mufu Yan,Yanxiang Zhang,Wenping Sheng,Yan Wang,Shimiao Xu,Fengshou Gu,Chaohui Wang,Weidong Cheng
出处
期刊:Coatings [Multidisciplinary Digital Publishing Institute]
卷期号:14 (3): 303-303
标识
DOI:10.3390/coatings14030303
摘要

This paper investigates the effect of the element La on plasma nitriding of the CoCrCuFeNi high-entropy alloy (HEA) at 440 °C for 8, 16, and 24 h. The phase composition, morphology, and hardness distribution of the nitrided layer are characterized using XRD, optical microscopy, and a microhardness tester. Furthermore, the corrosion resistance is tested using an electrochemical workstation. The study evaluated the friction and wear performance using a testing machine and scanning electron microscope. The thickness of the effective hardening layer after 16 h of treatment with La was similar to that after 24 h of treatment without La. The addition of La significantly increased the growth rate constant of the effective hardening layer from 0.53 × 10−14 m2/s to 0.72 × 10−14 m2/s. In addition, an expanded FCC phase with greater interplanar spacing can be formed on the surface of the sample by introducing La into the plasma nitriding process. This indicates that the expanded FCC phase, with a higher concentration of interstitial nitrogen atoms, can effectively improve the corrosion resistance of the specimen surface. The corrosion rate of the specimen surface was reduced by 27.5% and the wear rate was reduced by 41.7% after 16 h of treatment with the addition of La compared to 24 h of nitriding without the addition of La. It has been shown that the addition of La to the plasma nitriding process results in a higher quality nitrided layer in a shorter time and also demonstrates that La has the potential to optimize the surface properties of plasma nitrided HEAs.
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