P‐6.5: Advanced Black Matrix Photoresist for Next Generation Color Filters

A new black matrix photoresist was formulated to achieve high Optical Density (OD 4.0∼4.2/um), high resolution ((line width ≤5μm), high surface resistance (> 1 × 10 14 Ω / □), and high taper angle (> 70 °) performance. Extremely low exposure dose energy (<50mJ/cm2) also enables high throughput for volume manufacturing large area color filters. This new black photoresist has high potential to be used for 8K UHDTV and related applications.