Nitrogen defect structure and NO+ intermediate promoted photocatalytic NO removal on H2 treated g-C3N4

光催化 氮气 材料科学 氧气 辐照 光化学 带隙 化学 催化作用 化学工程 制氢 光电子学 有机化学 核物理学 工程类 物理
作者
Jiazhen Liao,Wen Cui,Jieyuan Li,Jianping Sheng,Hong Wang,Xing’an Dong,Peng Chen,Guangming Jiang,Zhiming Wang,Fan Dong
出处
期刊:Chemical Engineering Journal [Elsevier BV]
卷期号:379: 122282-122282 被引量:314
标识
DOI:10.1016/j.cej.2019.122282
摘要

By heating g-C3N4 powder in the hydrogen atmosphere, nitrogen defects were introduced into the framework of g-C3N4 where the nitrogen atoms in g-C3N4 were reacted and partially removed with hydrogen. The effects of nitrogen defects on the electronic structure, optical properties, generation of reactive oxygen species and photocatalytic NO oxidation of g-C3N4 were investigated by combining experimental characterization and DFT theoretical calculations. The N defect is located at N2C sites and can be tuned by the H2 treating temperature. The obtained N defective g-C3N4 products possessed narrower bandgap adjusted by surface N defects and were able to promote the separation of photoexcited charge carries and produce reactive oxygen species more efficiently than pristine g-C3N4. The NO+ reaction intermediate was formed on the N defects sites and enabled an accelerated photocatalytic reaction that contributed to enhanced photocatalytic NO removal. The NO removal ratio on N defects g-C3N4 obtained at 600 °C (CH-H-600) was 2.6 times that of pristine g-C3N4 under visible light irradiation. The present work could provide new insights into the understanding of the role of N-defects in g-C3N4 and application of photocatalytic technology for efficient air purification.
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