材料科学
氧化物
串联
图层(电子)
钨
缓冲器(光纤)
氧化铌
钙钛矿(结构)
电极
光电子学
溅射
不透明度
纳米技术
化学工程
薄膜
光学
复合材料
化学
冶金
电气工程
物理化学
工程类
物理
作者
Helen Hejin Park,Jincheol Kim,Geunjin Kim,Hyunmin Jung,Songhee Kim,Chan Su Moon,Seon Joo Lee,Seong Sik Shin,Xiaojing Hao,Jae Sung Yun,Martin A. Green,Anita Ho‐Baillie,Nam Joong Jeon,Tae‐Youl Yang,Jangwon Seo
标识
DOI:10.1002/smtd.202000074
摘要
Abstract For semitransparent devices with n‐i‐p structures, a metal oxide buffer material is commonly used to protect the organic hole transporting layer from damage due to sputtering of the transparent conducting oxide. Here, a surface treatment approach is addressed for tungsten oxide‐based transparent electrodes through slight modification of the tungsten oxide surface with niobium oxide. Incorporation of this transparent electrode technique to the protective buffer layer significantly recovers the fill factor from 70.4% to 80.3%, approaching fill factor values of conventional opaque devices, which results in power conversion efficiencies over 18% for the semitransparent perovskite solar cells. Application of this approach to a four‐terminal tandem configuration with a silicon bottom cell is demonstrated.
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