材料科学
CMOS芯片
横截面
横模
极化(电化学)
光学
级联
光电子学
电场
电压
插入损耗
电气工程
物理
工程类
激光器
化学
物理化学
结构工程
量子力学
化学工程
作者
Reona Motoji,Hirotaka Uemura,Naoki Matsui,Dan Maeda,Tomoya Sugita
标识
DOI:10.1109/icsj55786.2022.10034717
摘要
We developed a spot size converter (SSC) that can be fabricated with a 0.18 µm CMOS process. The SSC has a partial half-height SiN sturucture to reduce polarization dependent loss (PDL). In order to expand the mode field diameter (MFD) and suppress radiation, SiON structures are introduced. As a result of the measurement, the optical losses for mode expansion were 0.5 dB for the transverse electric (TE) mode and 0.7 dB for the transverse magnetic (TM) mode, respectively. PDL was 0.2 dB and the MFD was between 6.0 µmand 8.0 µm.
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